High-resolution time-lapse images of the advancing microscopic contact line of a Wenzel droplet on a micropillar surface (diameter D=7 μm, pitch L=20 μm and height H=13 μm, Fig. 2a) were obtained .

These SEM images show line gratings the researchers created using DLW with peripheral photoinhibition and a donut-shaped ...

These SEM images show line gratings the researchers created using DLW with peripheral photoinhibition and a donut-shaped inhibition beam. (a, b) Line gratings with a sub-140 nm resolution printed ...

In a stellar nursery 460 light-years away, astronomers sharpened old ALMA data and spotted crisp rings and spirals swirling ...

Institute of Physics. (2015, March 10). Fractal patterns may uncover new line of attack on cancer. ScienceDaily. Retrieved June 2, 2025 from www.sciencedaily.com / releases / 2015 / 03 ...

TOKYO, December 12, 2024--DNP has achieved the fine pattern resolution required for photomasks for logic semiconductors of beyond 2nm generation that support EUV lithography.

Commences sample supply of high-NA EUV photomasks for next-generation semiconductors Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required ...

DNP has achieved the fine pattern resolution required for photomasks for logic semiconductors of beyond 2nm generation that support EUV lithography.