High-resolution time-lapse images of the advancing microscopic contact line of a Wenzel droplet on a micropillar surface (diameter D=7 μm, pitch L=20 μm and height H=13 μm, Fig. 2a) were obtained .

These SEM images show line gratings the researchers created using DLW with peripheral photoinhibition and a donut-shaped ...

These SEM images show line gratings the researchers created using DLW with peripheral photoinhibition and a donut-shaped inhibition beam. (a, b) Line gratings with a sub-140 nm resolution printed ...

The dynamic out-of-equilibrium molecular patterns of living matter can therefore not be captured, and photobleaching still limits photon collection. To bypass chemical fixation and halt ...

TOKYO, December 12, 2024--DNP has achieved the fine pattern resolution required for photomasks for logic semiconductors of beyond 2nm generation that support EUV lithography.

DNP has achieved the fine pattern resolution required for photomasks for logic semiconductors of beyond 2nm generation that support EUV lithography.

TOKYO, December 12, 2024--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of ...